Electron beam evaporation ukutyabeka

I-electron beam evaporation method luhlobo lwe-vacuum evaporation coating, esebenzisa imiqadi ye-electron ukufudumeza ngokuthe ngqo izinto zomphunga phantsi kweemeko ze-vacuum, i-vacuum imathiriyeli ibe ngumphunga kwaye ihanjiswe kwi-substrate, kwaye ijike kwi-substrate ukwenza ifilimu ebhityileyo. Kwisixhobo sokufudumala se-electron beam, into evuthayo ifakwe kwi-crucible yamanzi epholileyo, enokuphepha ukusabela phakathi kwezinto ezikhuphayo kunye nodonga olunqamlekileyo kwaye luchaphazela umgangatho wefilimu. Izikhonkwane ezininzi zinokufakwa kwisixhobo ukuze kuphunyezwe ukuphuphuma komphunga ngaxeshanye okanye okwahlukileyo kunye nokubekwa kwezinto ezahlukeneyo. Ngokuphuphuma komqadi we-electron, nayiphi na imathiriyeli inokujika ibe ngumphunga.

Umphunga we-Electron ungakhupha umphunga kwindawo ephezulu yokunyibilika. Xa kuthelekiswa nobushushu obuqhelekileyo bokumelana nokunyuka komphunga, kunokusebenza okuphezulu kwe-thermal, ukuxinana okuphezulu kwe-beam yangoku, kunye nesantya esikhawulezayo sokuphuma komphunga. Ifilimu kunye nefilimu yezinto ezahlukeneyo ezibonakalayo ezifana neglasi eqhubayo.
Uphawu lwe-electron beam evaporation kukuba ayiyi kugquma okanye ingafane igubungele macala amabini ekujoliswe kuyo kwi-dimensional structure, kwaye ngokuqhelekileyo ibeka kuphela kwindawo ekujoliswe kuyo. Lo ngumahluko phakathi kokuphuphuma komqadi we-electron kunye nokutshiza.

I-Electron beam evaporation iqhele ukusetyenziswa kwinkalo yophando lwe-semiconductor kunye neshishini. Amandla eelektroni akhawulezayo asetyenziselwa ukubetha into ekujoliswe kuyo, ebangela ukuba into ekujoliswe kuyo ibe ngumphunga kwaye inyuke. Ekugqibeleni idipozithwe koko bekujoliswe kuko.